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The presentation by Marco Sangermano, Politecnico di Torino, on functional materials obtained by cationic UV-curing illustrated an approach using an alternate UV-curable chemistry to achieve multiperformance materials. Another presentation with direct industrial application was a review by Kurt Dietliker, Swiss Federal Institute of Technology, Zurich, on photoinitiators with industrial relevance. To end the conference on a high note, Prof.
Chris Bowman spoke on complex responsive polymer structures by photopolymerization reactions.
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To enhance the strong schedule of speakers, several poster sessions were set up during the breaks from the formal presentations. In line with the conference theme, the topics covered by the 58 poster presenters included a wide range of relevant science and technology. Similar to the formal speaking schedule, professors, industrial scientists and students gave high-level presentations on a wide range of UV- and EB-curing topics. A great feature of the poster presentations was the ability to engage in detailed discussions with each presenter, allowing more time for questions to be answered and new ideas to be pursued.
In addition to the main speaker program and located in tandem with the poster sessions, a vendor exhibit area was available with tabletop exhibits from a wide range of companies and organizations. A total of nine exhibitors were available another record during the designated exhibit hours for both formal and informal discussions with attendees.
With the growing number of both academic and industrial attendees and the positive feedback received by the conference organizers, the next conference is being scheduled for the fall of in Boulder, Colorado. I hope to see you there!
NSF Award Search: Award# - I/UCRC for Fundamentals and Applications of Photopolymerizations
Advertise Contact Subscribe Events. Home Articles Photopolymerization Fundamentals Mike J. Idacavage , vice president of business development, Colorado Photopolymer Solutions In most areas of technology, there is no lack of conferences and tradeshows throughout the year for those interested in learning about the latest advances or the most recent market trends.
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Photopolymerization Fundamentals 2015
Daicel ChemTech. For more information or to register to exhibit contact Neil Cramer at neil. Tetraacylstannane as highly reactive Type I photoinitiators for long wavelength curing applications. The San Jose Airport is just about an hour and 15 minutes away, while the San Francisco Airport is around 90 minutes away.
Reservations are required for door to door service. Individual cancellations must be received within 24 hours of arrival to avoid full rate for the entire stay. Register Now.
No refunds will be given for cancellations after September 1,